--Suitable for lithography of any kind of substrate which diameter below 100mm(customize bigger) and thickness between 0-4mm.
--High uniformity fly-eye exposure head /Â air flotation leveling mechanism /Â reliable vacuum clamping exposure.
--Above feature make sure the high resolution and high uniformity.
--Aligning method by mask keep stable and substrate feeding, which make sure the consistency of the guide gravity and the force.
--Using gapless straight guide, high precision, fast speed.
Specification:
1, Power:220v 50Hz,Air source:>=0.4Mpa,Vacuum:-0.07~0.08Mpa
2,Dimension:720*720*882mm,wight:100kg
3,Exposure range:<=D117mm. one-side exposure.
4,Non uniformity: +-3% in D100mm
5,Time set:0.1-999.9 seconds
6,Contact exposure, with 3Â kinds of exposure: hard contact exposure, soft contact exposure, light force contact exposure.
7,Resolution requirement: better than 1um.
8,With 3Â kinds of chuck, can vacuum chuck rectangular mask which is 5''*5" or 4"*4" or 3"*3". no limit for the thickness(1-6mm is ok.).
9,With 3Â pcs of vacuum suck holder for substrate, for 4",3",2"Â Â substrate,optional customize 5" ,6" substrate.
10,Alignment:with 2Â microscope and also 2Â CCD is assembly to the microscopes, can see from the screen.
a,microscope 0.7X-4.5X continuously doubling.
b,observation system is 0.7*57=40X(min),4.5*57=256X(max),or (91x~570x).
c,align table:X,Y:+-5mm, angle<=+-5degree.
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Guangzhou minder-hightech co., ltd      Â
No.1 Xingya 3Â Road, panyu district, guangzhou, China
Shunyu Hu   0086-15813334038 Â
Cell phone
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